Patent · US Active

Aromatic underlayer

US12099300B2 · kind B2 · utility

0Cited by

3References

13Claims

0Family size

Assignee

Rohm and Haas Electronic Materials LLC · US

Inventors

Sheng Liu · Bow, US
James F. Cameron · Brookline, US
Shintaro Yamada · Shrewsbury, US
Iou-Sheng Ke · Andover, US
Keren Zhang · Blacksburg, US
Daniel Greene · Pendleton, US
Paul J. LaBeaume · Auburn, US
Li Cui · Westborough, US
Suzanne M. Coley · Mansfield, US

Key dates

Filing date	Oct 10, 2019
Grant date	Sep 24, 2024
Priority date	—
Expiry date	Oct 28, 2040

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/2016
WIPO fieldOptics
WIPO sectorInstruments

Abstract

Compounds having three or more alkynyl moieties substituted with an aromatic moiety having one or more of certain substituents are useful in forming underlayers useful in semiconductor manufacturing processes.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.