Method and system for overlay error compensation and computer-readable storage medium
US12100135B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 22, 2022 |
| Grant date | Sep 24, 2024 |
| Priority date | — |
| Expiry date | Apr 25, 2043 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T2207/30148
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Disclosed are a method and system for overlay error compensation and a storage medium. The method includes that N wafer groups are provided, wherein each wafer group includes M wafers each including a present and previous layer, and N and M are positive integers greater than or equal to 2; for each wafer, a first overlay error is determined according to device structures of the present and previous layers, and a photoetching compensation value is calculated according to the first overlay error; for each wafer group, a first average compensation value is calculated according to photoetching compensation values; a second average compensation value of the N wafer groups is calculated according to first average compensation values; and in response to that the second average compensation value is within a preset range, the second average compensation value is fed to a batch control system to compensate an (N+1)th wafer group.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.