Mask for deposition
US12103024B2 · kind B2 · utility
0Cited by
90References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 1, 2022 |
| Grant date | Oct 1, 2024 |
| Priority date | — |
| Expiry date | Aug 1, 2042 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/042
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A deposition mask including a resin film including first holes, a non-resin layer disposed on the resin film and including second holes corresponding to the first holes, and a protective layer disposed on the non-resin layer and including third holes corresponding to the first holes, wherein the protective layer includes a first portion disposed on a top surface of the non-resin layer, and a second portion covering a side surface of the second holes of the non-resin layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.