Patent · US Active

Assembly, in particular in a microlithographic projection exposure apparatus

US12105434B2 · kind B2 · utility

0Cited by

0References

20Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Stefan Troeger · Ulm, DE
Thomas Gorius · Lauchheim, DE

Key dates

Filing date	Oct 17, 2022
Grant date	Oct 1, 2024
Priority date	—
Expiry date	Jun 9, 2043

Classification

Technology area (CPC G)Physics
CPC primaryG02B5/09
WIPO fieldOptics
WIPO sectorInstruments

Abstract

An assembly, for example in a microlithographic projection exposure apparatus, comprises an optical element and a joint arrangement for mechanically bearing the optical element. The joint arrangement comprises at least one connecting element secured on the optical element. The mass of the connecting element is distributed over its length so that the moment of inertia of the connecting element is increased in comparison with a connecting element of identical mass and length in which the mass is distributed uniformly over the length.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.