Patent · US Active

Polishing device

US12115620B2 · kind B2 · utility

0Cited by

5References

13Claims

0Family size

Assignee

Rud. Starcke GmbH & Co. KG · DE

Inventors

Werner UNNERSTALL · Melle, DE
Christian Wall · Hitzhofen, DE
Christian BURSTEIN · Werther, DE
Stephan KAMPMEYER · Melle, DE
Diethard Sinram · Meinerzhagen, DE
Peter Alfer · Melle, DE

Key dates

Filing date	Aug 30, 2019
Grant date	Oct 15, 2024
Priority date	—
Expiry date	Jun 7, 2041

Classification

Technology area (CPC B)Performing Operations; Transporting
CPC primaryB24D13/18
WIPO fieldMachine tools
WIPO sectorMechanical engineering

Abstract

A polishing device is held on a robot arm and has a support plate, a polishing disc held on the support plate, a drive moving the support plate in a plane, and a metering device for feeding a polishing agent to the working side of the polishing disc. An application nozzle of the metering device is guided through an open central axis of the support plate, the polishing disc having a central opening for allowing the passage of the polishing agent metered in computer-controlled manner.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.