Fade-resistant water-dispersible phenol-free direct thermal media
US12115803B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Aug 20, 2021 |
| Grant date | Oct 15, 2024 |
| Priority date | — |
| Expiry date | Aug 26, 2041 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB41M2205/38
- WIPO fieldTextile and paper machines
- WIPO sectorMechanical engineering
Abstract
We disclose specialized direct thermal recording media that are both phenol-free and water-dispersible. The thermally responsive layer of such media includes a leuco dye and an acidic developer. To avoid image fade and image formation problems associated with certain demanding environmental storage conditions, the developer is not only phenol-free but also a derivative of N,N′-diphenylurea. The thermal recording medium also includes a base coat between the substrate and the thermally responsive layer, the base coat containing a non-water-soluble binder, and a top coat carried by the substrate such that the thermally responsive layer is between the top coat and the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.