Sample analysis system, learned model generation method, and sample analysis method
US12117343B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 10, 2020 |
| Grant date | Oct 15, 2024 |
| Priority date | — |
| Expiry date | Jul 18, 2041 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01J2003/2859
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Provided is a sample analysis system including: a droplet device configured to intermittently introduce a sample to a measurement region set in plasma; a light emission detection device configured to detect light emission in the measurement region at a detection timing, the detection timing being set at a predetermined cycle in advance; and an analysis device configured to analyze the sample based on the detected light emission, wherein the analysis device is provided with: a distribution computing unit configured to compute a time-spatial light intensity distribution based on the detected light emission, the time-spatial light intensity distribution being a distribution of a light intensity according to the detection timing, a position in the measurement region, and a wavelength component of the light emission; and a characteristic specifying unit configured to compute, from the time-spatial light intensity distribution, a feature amount that correlates with a sample characteristic indicating a property of the sample and specify the sample characteristic based on the feature amount.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.