System and method for using mechanical loading to create spatially patterned meta surfaces for optical components
US12117588B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 23, 2021 |
| Grant date | Oct 15, 2024 |
| Priority date | — |
| Expiry date | Apr 11, 2043 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB82Y40/00
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
The present disclosure relates to a system for producing a patterned nanostructured surface on a component from a pre-existing, nanostructured surface with a first spatial feature distribution on the component. The system makes use of a force application element configured to apply a force to the pre-existing, nanostructured surface, and a force application control subsystem. The force application control subsystem is configured to control elevational movement of the force application element along a first axis of movement into and out of contact with the pre-existing, nanostructured surface to apply a predetermined load to the pre-existing, nanostructured surface. The predetermined load is sufficient to modify the pre-existing, non-patterned nanostructured surface to create the patterned nanostructured surface.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.