Patent · US Active

Use of clean and dry gas for particle removal and assembly therefor

US12121842B2 · kind B2 · utility

0Cited by
5References
14Claims
0Family size

Assignee

Inventors

Key dates

Filing dateAug 29, 2019
Grant dateOct 22, 2024
Priority date
Expiry dateOct 3, 2041

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG01N15/0612
  • WIPO fieldChemical engineering
  • WIPO sectorChemistry

Abstract

The invention features particle removal assemblies and methods for removing dust and other debris from a sample container, e.g., to improve counting colonies of microorganisms (e.g., bacteria, fungi, or protists) present in environmental, pharmaceutical, biological, and other samples. An assembly of the invention includes components for particle removal, e.g., a filter, a dryer, a flow controller, and an outlet. The invention also provides methods of detecting samples after cleaning a sample container with clean and/or dry gas.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.