Patent · US Active

Apparatus and method for exposure of relief precursors

US12124171B2 · kind B2 · utility

0Cited by

0References

16Claims

0Family size

Assignee

XSYS PREPRESS N.V. · BE

Inventors

Pieter Lenssens · Zottegem, BE
Frederik DEFOUR · Boezinge, BE

Key dates

Filing date	Jul 14, 2020
Grant date	Oct 22, 2024
Priority date	—
Expiry date	Jul 14, 2040

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70891
WIPO fieldOptics
WIPO sectorInstruments

Abstract

An apparatus for exposure of a relief precursor (P) which comprises a substrate layer and at least one photosensitive layer. The apparatus includes a carrying structure for carrying a relief precursor and an LED array configured to illuminate a photosensitive layer of the relief precursor carried by the carrying structure. The LED array is configured to illuminate simultaneously a predetermined surface area of at least 900 cm2. The LED array includes a plurality of subsets of one or more LEDs, each subset being individually controllable. The apparatus also includes a control unit to control the plurality of subsets individually, and such that an irradiation intensity difference in the predetermined surface area is within a predetermined range.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.