Patent · US Active

Method for manufacturing ferromagnetic-dielectric composite material

US12125713B2 · kind B2 · utility

0Cited by
45References
8Claims
0Family size

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Key dates

Filing dateMar 22, 2022
Grant dateOct 22, 2024
Priority date
Expiry dateMar 22, 2042

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10D1/20
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

A method for manufacturing a ferromagnetic-dielectric composite material comprises: (a) placing patterned ferromagnetic layer regions, in a patterning substrate assembly that includes a patterning substrate and a first dielectric layer, in physical contact with a second dielectric layer, the second dielectric layer in a receiving substrate assembly that includes a receiving substrate, (b) forming a bond between the patterned ferromagnetic layer regions and the second dielectric layer; (c) releasing the patterning substrate from the patterning substrate assembly to transfer the patterned ferromagnetic layer regions and the first dielectric layer from the patterning substrate assembly to the receiving substrate assembly; and (d) releasing the receiving substrate from the receiving substrate assembly to form the ferromagnetic-dielectric composite material.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.