Patent · US Active

Silicon carbide power device with improved robustness and corresponding manufacturing process

US12125762B2 · kind B2 · utility

0Cited by
5References
18Claims
0Family size

Assignee

Inventors

Key dates

Filing dateNov 3, 2022
Grant dateOct 22, 2024
Priority date
Expiry dateDec 30, 2042

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10D62/106
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

An electronic power device includes a substrate of silicon carbide (SiC) having a front surface and a rear surface which lie in a horizontal plane and are opposite to one another along a vertical axis. The substrate includes an active area, provided in which are a number of doped regions, and an edge area, which is not active, distinct from and surrounding the active area. A dielectric region is arranged above the front surface, in at least the edge area. A passivation layer is arranged above the front surface of the substrate, and is in contact with the dielectric region in the edge area. The passivation layer includes at least one anchorage region that extends through the thickness of the dielectric region at the edge area, such as to define a mechanical anchorage for the passivation layer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.