Manufacturing method for vapor deposition mask device and manufacturing apparatus for vapor deposition mask device
US12128500B2 · kind B2 · utility
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31Claims
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Key dates
| Filing date | Aug 8, 2018 |
| Grant date | Oct 29, 2024 |
| Priority date | — |
| Expiry date | Dec 6, 2041 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10K71/166
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
A method of manufacturing a vapor deposition mask device includes: a preparing step of preparing a vapor deposition mask that includes a plurality of through-holes extending from a first surface to a second surface; and a welding step of welding the vapor deposition mask to a front surface of a frame that includes the front surface and a back surface opposite to the front surface.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.