Patent · US Active

Silica substrates for slow release asphaltene control chemical squeeze treatments

US12129428B2 · kind B2 · utility

0Cited by
10References
18Claims
0Family size

Assignee

Inventors

Key dates

Filing dateDec 21, 2021
Grant dateOct 29, 2024
Priority date
Expiry dateDec 21, 2041

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC09K2208/10
  • WIPO fieldBasic materials chemistry
  • WIPO sectorChemistry

Abstract

The present disclosure provides methods and compositions for controlling asphaltenes in a subterranean formation. The compositions may include silica, a polymer, and optionally a charged surfactant. The compositions may also include a solvent or other additives. The methods may include injecting the compositions into subterranean formations and inhibiting asphaltene precipitation.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.