Apparent resistivity-depth section generating method for short-offset electromagnetic exploration
US12130403B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 21, 2021 |
| Grant date | Oct 29, 2024 |
| Priority date | — |
| Expiry date | Oct 21, 2041 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01V3/28
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
The present disclosure provides an apparent resistivity-depth section generating method for short-offset electromagnetic exploration, including: determining, in field zones divided quantitatively based on the induction number, positions of a recording point for each of observation points and frequencies or a time window thereof, and taking determined positions of the recording point as the assignment point for the observation point and the frequencies or the time window thereof, where one survey line of an axial configuration generates one apparent resistivity-depth section along the survey line; and one survey line of an equatorial configuration typically generates one apparent resistivity-depth section along the survey line, and apparent resistivity-depth sections along connecting lines from the observation points to the source which are the same as observation points in the number.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.