Oxide-based doping of evaporable getter
US12138613B2 · kind B2 · utility
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6References
20Claims
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Key dates
| Filing date | Sep 27, 2022 |
| Grant date | Nov 12, 2024 |
| Priority date | — |
| Expiry date | Dec 10, 2042 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB22F2999/00
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Systems and methods for oxide-based doping of an evaporable getter are described herein. In certain embodiments, a method includes mixing a first getter material with a second getter material to create a mixed getter material. The method also includes mixing an oxide dopant with the mixed getter material to create a doped getter material. Further, the method includes sealing the doped getter material within a device. Moreover, the method includes applying heat to the doped getter material to cause the doped getter material to emit a doped gas for deposition on internal surfaces of the device.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.