Method for manufacturing liquid ejection head substrate and method for manufacturing liquid ejection head
US12138928B2 · kind B2 · utility
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3References
12Claims
0Family size
Assignee
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Key dates
| Filing date | Aug 12, 2022 |
| Grant date | Nov 12, 2024 |
| Priority date | — |
| Expiry date | May 12, 2043 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB41J2/1642
- WIPO fieldTextile and paper machines
- WIPO sectorMechanical engineering
Abstract
Provided is a method for manufacturing a liquid ejection head substrate and a method for manufacturing a liquid ejection head capable of reducing degradation of the quality of a printed image. To this end, in formation of a liquid ejection head substrate, a part required to have more precise relative positional relation or not required to have high fabrication precision is set as a first part, and for the first part, a single-shot exposure method is employed. Also, a part required to have higher fabrication precision is set as a second part, and for the second part, a split exposure method is employed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.