Vacuum deposition facility and method for coating a substrate
US12139784B2 · kind B2 · utility
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4References
31Claims
0Family size
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Key dates
| Filing date | Dec 11, 2018 |
| Grant date | Nov 12, 2024 |
| Priority date | — |
| Expiry date | Mar 27, 2040 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C14/564
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A vacuum deposition facility for continuously depositing, on a running substrate, coatings formed from metal or metal alloy, and including:
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.