Patent · US Active

Systems and methods for high-rate electrochemical arsine generation

US12139804B2 · kind B2 · utility

0Cited by
2References
20Claims
0Family size

Assignee

Inventors

Key dates

Filing dateSep 10, 2021
Grant dateNov 12, 2024
Priority date
Expiry dateSep 8, 2042

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC23C16/448
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

A system and method for generating arsine are disclosed. The system may include a shell having a top interior surface. The system may also include a cathode-anode assembly positioned in the shell and forming an elongated structure substantially parallel to the top surface. The cathode-anode assembly may include a first electrode and a second electrode surrounding the first electrode and forming a gap therebetween. The second electrode may include a plurality of channels along a length of the second electrode. The plurality of channels may allow circulation of electrolyte within and around at least a portion of the cathode-anode assembly and allow gases generated in response to current applied to the cathode-anode assembly to escape from the cathode-anode assembly. Such gases may be used as precursor gases for a high-volume metal-organic chemical vapor deposition (MOCVD) operation.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.