Patent · US Active

Device for regulating a mixing ratio of a gas mixture

US12140309B2 · kind B2 · utility

0Cited by
8References
42Claims
0Family size

Assignee

Inventors

Key dates

Filing dateOct 5, 2018
Grant dateNov 12, 2024
Priority date
Expiry dateFeb 17, 2040

Classification

  • Technology area (CPC F)Mechanical Engineering; Lighting; Heating
  • CPC primaryF23N2239/04
  • WIPO fieldThermal processes and apparatus
  • WIPO sectorMechanical engineering

Abstract

A regulation device for regulating a mixing ratio (x) of a gas mixture comprises a first conduit (1) for carrying a flow of a first gas (e.g., air) and a second conduit (2) for carrying a flow of a second gas (e.g., a fuel gas). The first and second conduits (1, 2) open out into a common conduit (3) in a mixing region (M) to form the gas mixture. A first sensor (S1) is configured to determine at least one thermal parameter of the gas mixture downstream from the mixing region. A control device (10) is configured to receive, from the first sensor, sensor signals indicative of the at least one thermal parameter of the gas mixture and to derive control signals for adjusting device (V1) acting to adjust the mixing ratio, based on the at least one thermal parameter.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.