Inorganic-infiltrated polymer hybrid thin film resists for advanced lithography
US12140865B2 · kind B2 · utility
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22Claims
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Key dates
| Filing date | Mar 4, 2020 |
| Grant date | Nov 12, 2024 |
| Priority date | — |
| Expiry date | Mar 4, 2040 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08K3/08
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention provides a method that utilizes an existing infrastructure such as atomic layer deposition or similar vapor-based deposition tool or metal salt solutions based infiltration to infiltrate certain metals or metal-based precursors into resist materials to enhance the performance of the resists for the advancement of lithography techniques.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.