Patent · US Active

System and method for jetting dispenser positional control

US12145161B2 · kind B2 · utility

0Cited by
1References
24Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJun 25, 2019
Grant dateNov 19, 2024
Priority date
Expiry dateDec 17, 2041

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH05K2203/013
  • WIPO fieldAudio-visual technology
  • WIPO sectorElectrical engineering

Abstract

Systems and methods of controlling movement of a moving part of an applicator for jetting material from the applicator are disclosed. The method includes actuating a piezoelectric device operatively connected to a needle by providing a voltage waveform to the piezoelectric device, such that the needle translates along a positional path in a first dispensing operation. The method also includes sensing positions of the moving part over a period of time, where the positions define a time-dependent positional profile of the moving part, and receiving parameters for a second dispensing operation. The method also includes determining a required voltage waveform to be applied to the piezoelectric device to perform the second dispensing operation, and adjusting the voltage waveform provided to the piezoelectric device to match the required positional profile.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.