Thin film optical lens and method for coating a lens
US12147008B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 23, 2020 |
| Grant date | Nov 19, 2024 |
| Priority date | — |
| Expiry date | Feb 21, 2043 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B5/283
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A thin film optical lens and method for coating an optical substrate serves to apply alternating layers, with varying thicknesses, of a high index dielectric material and a low index dielectric material on first and second surfaces of an optical substrate. The high and low index dielectric materials are layered through thin film deposition. The low index dielectric material is SiO2. The high index dielectric material is ZrO2 and/or Indium Zinc Oxide. The spectral results from application of high and low index dielectric materials reduce infrared radiation, block HEV light transmission, and reduce backside ultraviolet reflections, while also increasing visible (ultraviolet) light transmission through the optical substrate. Thus, the layering of dielectric materials on the first surface of optical substrate reflects up to 40% of the infrared radiation; and the second surface of optical substrate transmits up to 99% of ultraviolet light in the wavelength range between 300 to 400 nanometers.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.