Device and method for calibration, monitoring and control of the integrated photonic systems
US12147095B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 31, 2023 |
| Grant date | Nov 19, 2024 |
| Priority date | — |
| Expiry date | Jan 31, 2043 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F2201/58
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A device and methods, the device comprising: a photo detector comprising a waveguide; two metal layers connected to the photo detector; a measurement device connected between the two metal layers, for measuring an electric parameter between the two metal layers, said electric parameter indicative of an amount of light propagating through the waveguide; and a voltage source connected between the two metal layers, wherein applying voltage between the two metal layers changes a refraction index of the waveguide, thereby affecting a phase of light propagating through the waveguide, and wherein the voltage to be applied is determined in accordance with the resistance measured by the resistance measurement device.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.