Patent · US Active

Method to integrate DC and RF phase change switches into high-speed SiGe BiCMOS

US12150316B2 · kind B2 · utility

0Cited by
17References
11Claims
0Family size

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Key dates

Filing dateNov 7, 2022
Grant dateNov 19, 2024
Priority date
Expiry dateJan 20, 2043

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10D84/401

Abstract

A method of integrating a phase change switch (PCS) into a Bipolar (Bi)/Complementary Metal Oxide Semiconductor (CMOS) (BiCMOS) process, comprises providing a base structure including BiCMOS circuitry on a semiconductor substrate, and forming on the base structure a dielectric contact window layer having metal through-plugs that contact the BiCMOS circuitry. The method includes constructing the PCS on the contact window layer. The PCS includes: a phase change region, between ohmic contacts on the phase change region, to operate as a switch controlled by heat. The method further includes forming, on the contact window layer and the PCS, a stack of alternating patterned metal layers and dielectric layers that interconnect the patterned metal layers, such that the stack connects a first of the ohmic contacts to the BiCMOS circuitry and provides connections to a second of the ohmic contacts and to the resistive heater.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.