Chamber for an ionization vacuum gauge
US12154771B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 2, 2024 |
| Grant date | Nov 26, 2024 |
| Priority date | — |
| Expiry date | Feb 2, 2044 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J41/02
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Chamber (11, 12, 13) for bounding a plasma generation area (42) in a vacuum pressure sensor (40), wherein the chamber comprises an electrically conductive casing element (1, 1′, 1″) located radially on the outside relative to a central axis, wherein the chamber comprises electrically conductive wall elements (2, 2′, 2″) arranged substantially perpendicular to the central axis and connected to the casing element, wherein at least one of the wall elements has a first opening (3), through which the central axis extends, wherein the casing element comprises at least a first (B1) and a second region (B2), wherein the first region is located closer to the central axis than the second region. The invention further relates to a vacuum pressure sensor comprising the chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.