Patent · US Active

Method for manufacturing ink for photonic annealing, and method for manufacturing surface-functionalized metal film

US12157828B2 · kind B2 · utility

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Key dates

Filing dateMay 18, 2023
Grant dateDec 3, 2024
Priority date
Expiry dateMay 18, 2043

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01B1/02
  • WIPO fieldBasic materials chemistry
  • WIPO sectorChemistry

Abstract

A method of manufacturing an ink for photonic annealing includes manufacturing surface-modified metal nanoparticles using a first surface modifier, manufacturing surface-modified metal micron particles using a second surface modifier, and mixing a solution containing the surface-modified metal micron particles with the surface-modified metal nanoparticles to manufacture an ink for photonic annealing in which, in the ink for photonic annealing, the metal nanoparticles are adsorbed on a surface of the micron particles, and the metal nanoparticles are adsorbed in a single layer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.