Exposure device
US12158702B2 · kind B2 · utility
0Cited by
4References
12Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Mar 11, 2021 |
| Grant date | Dec 3, 2024 |
| Priority date | — |
| Expiry date | Mar 11, 2041 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B27/283
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Provided is an exposure device capable of improving exposure accuracy while ensuring throughput. The exposure device 100 includes: a reflective liquid-crystal modulating device 21, 22; a light source device 10 uniformly illuminating the reflective liquid-crystal modulating device 21, 22 with power-stabilized pulsed laser light in a ultraviolet wavelength band; a projection optical system 30 forming an image of reflected light modulated by the reflective liquid-crystal modulating device 21, 22; and a stage 40 supporting a target on which exposure is performed by a pattern imaged by the projection optical system 30.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.