Method for reproducing a target wavefront of an imaging optical production system, and metrology system for carrying out the method

US12158703B2 · kind B2 · utility

Assignee

• Carl Zeiss SMT GmbH · DE

Inventors

• Lukas Fischer · Zürich, CH
• Klaus Gwosch · Oettingen, DE
• Markus Koch · Neu-Ulm, DE
• Mario Laengle · Jena, DE
• Daniel Pagel · Tauchenweiler, DE

Key dates

• Filing date: Oct 20, 2022
• Grant date: Dec 3, 2024
• Expiry date: Jan 27, 2043

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/706849
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

An optical measuring system is used to reproduce a target wavefront of an imaging optical production system when an object is illuminated with illumination light. The optical measuring system comprises an object holder displaceable by actuator means and at least one optical component displaceable by actuator means. Within the scope of the target wavefront reproduction, a starting actuator position set (X0), in which each actuator is assigned a starting actuator position, is initially specified. An expected design wavefront (WD) which approximates the target wavefront and which the optical measuring system produces as a set wavefront is determined. A coarse measurement of a starting wavefront (W0) which the optical measuring system produces as actual wavefront after actually setting the starting actuator position set (X0) is carried out. Then, the object holder is adjusted by actuator means until a coarse target wavefront (W1) is obtained for a coarse actuator position set (X1) in the case of a minimum wavefront deviation between the actual wavefront and the design wavefront (WD). Said coarse target wavefront is then subjected to a fine measurement and the at least one optical compo…