Method for forming hole transport layer on surface of substrate, hole transport layer, solar cell and preparation method therefor, and photovoltaic module
US12159949B2 · kind B2 · utility
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20Claims
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Key dates
| Filing date | May 23, 2023 |
| Grant date | Dec 3, 2024 |
| Priority date | — |
| Expiry date | May 23, 2043 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10K30/40
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method for forming a hole transport layer on a surface of a substrate includes providing M target materials comprising inorganic hole transport materials and forming the hole transport layer on the surface of the substrate using magnetron sputtering. The hold transport layer at least comprises N consecutive sub-layers. M and N are integers and 2≤N≤M. One of the M target materials is a doped target material further comprising a doping material.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.