Excimer laser system with long service intervals
US12160080B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 7, 2020 |
| Grant date | Dec 3, 2024 |
| Priority date | — |
| Expiry date | Dec 2, 2041 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01S3/1305
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An excimer laser system includes first and second gas cylinders connected to a laser chamber for selectively supplying the laser chamber with gases that are needed to generate and emit laser pulsations having a certain energy level from the laser chamber. At least one of the first and second gas cylinders includes a halogen gas. The halogen gas is consumed during the operation of the excimer laser system. A computer system, included within the excimer laser system, is used to determine whether to resupply the laser chamber with halogen gas from the first and/or second cylinders, or to entirely flush out the gas contents of the laser chamber, and to resupply the flushed gas chamber with gas sourced from the first and/or second cylinders.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.