Displacement measuring apparatus, displacement measuring method and photolithography device
US12163814B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Apr 24, 2020 |
| Grant date | Dec 10, 2024 |
| Priority date | — |
| Expiry date | Sep 11, 2041 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01D5/268
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A displacement measuring apparatus, a displacement measuring method and a photolithography device are disclosed. The displacement measuring apparatus includes a light source module (300), a diffractive member (200), a reader head assembly (100), an optical detection module (410, 411, 412, 413) and a signal analysis module (500). The reader head assembly (100) is configured to receive two input light beams (610, 611) from the light source module (300) and guide them so that they come into contact in parallel with the diffractive member (200) and are both diffracted. The diffracted input light beams are guided and combined to form at least one output light beam (612, 613, 614) each containing diffracted light signals respectively of the two input light beams (610, 611), which exit in the same direction from the same light spot location of the diffractive member (200). Displacement information of the diffractive member (200) can be derived from phase change information contained in an interference signal produced by each output light beam (612, 613, 614). The displacement measuring apparatus and method can be used to achieve independent displacement measurements in different direction…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.