Inductively coupled plasma light source
US12165856B2 · kind B2 · utility
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174References
32Claims
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Key dates
| Filing date | Feb 21, 2022 |
| Grant date | Dec 10, 2024 |
| Priority date | — |
| Expiry date | Apr 6, 2042 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05G2/007
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A plasma chamber for a UV light source includes a plasma generation region that defines a plasma confinement region. A port is positioned adjacent to a side of the plasma generation region that allows generated light to pass out of the chamber. A high voltage region is coupled to the plasma generation region. A grounded region is coupled to the high voltage region that defines an outer surface configured to be coupled to the ground and is dimensioned for receiving a surrounding inductive core. A width of the high voltage region is greater than the width of the grounded region.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.