Patent · US Active

Magnet system, sputtering device and method

US12165857B2 · kind B2 · utility

0Cited by

1References

20Claims

0Family size

Assignee

VON ARDENNE Asset GmbH & Co KG · DE

Inventors

Klaus Schneider · Lappersdorf, DE
Goetz Grosser · Dresden, DE
Thorsten Sander · Dresden, DE
Ralf Hauswald · Bad Schandau, DE

Key dates

Filing date	Nov 11, 2022
Grant date	Dec 10, 2024
Priority date	—
Expiry date	Jan 19, 2043

Classification

Technology area (CPC H)Electricity
CPC primaryH01J37/3497
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

Disclosed herein are systems, devices, and methods for a magnet system for a sputtering device. The disclosed magnet system may include a housing having a housing interior. The magnet system may also include a magnet holder disposed in the housing interior and supported by the housing in a preferably stationary manner. The magnet system may also include a dehumidifying device adjacent to or disposed in the housing interior for drying the housing interior.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.