Patent · US Active

Reverse conducting IGBT with controlled anode injection

US12166111B2 · kind B2 · utility

0Cited by
6References
17Claims
0Family size

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Key dates

Filing dateJun 18, 2020
Grant dateDec 10, 2024
Priority date
Expiry dateApr 17, 2042

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10D64/117

Abstract

We herein describe a semiconductor device comprising a first element portion formed on a substrate, the first element portion being an operating region of an insulated gate bipolar transistor (IGBT) and a second element portion formed on the substrate, the second element portion being an operating region of a diode. The first element portion comprises a first collector region of a second conductivity type, a drift region of a first conductivity type located over the first collector region, and formed by the semiconductor substrate, a first body region of a first conductivity type located over the drift region, a second body region of a second conductivity type located over the drift region, at least one first contact region of a first conductivity type located above the second body region and having a higher doping concentration compared to the first body region, at least one second contact region of a second conductivity type located laterally adjacent to the at least one first contact region, the at least one second contact region having a higher doping concentration than the second body region, a first plurality of trenches extending from a surface through the second body region…

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.