Pulsed laser thermal excitation
US12171055B2 · kind B2 · utility
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25Claims
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Key dates
| Filing date | Feb 15, 2022 |
| Grant date | Dec 17, 2024 |
| Priority date | — |
| Expiry date | Jun 11, 2043 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H1/46
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
At a designated range an ultra-short pulse laser beam collapses focusing its power and thereby creating a plasma. A range specific thermal plasma is formed from a pulsed laser configured to produce a pulsed wavefront at a peak power. The peak power of the wavefront exceeds a self-focusing critical power level. An optical wavefront controlling element having one or more optical lens manipulates the pulsed wavefront based on a ratio of the peak power to the self-focusing critical power level, and an atmospheric condition, initiating whole beam collapse at the designated range.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.