Harmful substance removal system and method
US12172101B2 · kind B2 · utility
0Cited by
278References
18Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 12, 2023 |
| Grant date | Dec 24, 2024 |
| Priority date | — |
| Expiry date | May 12, 2043 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC02F2303/16
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A harmful substance removal system and method include a direct contact liquid concentrator having a gas inlet, a gas outlet, a mixing chamber disposed between the gas inlet and the gas outlet, and a liquid inlet for importing liquid into the mixing chamber. Gas and liquid mixing in the are mixed chamber and a portion of the liquid is vaporized. A demister is disposed downstream of the mixing chamber. The demister includes at least one stage of mist elimination having a first filter that removes particles greater than 9 microns. A fan is coupled to the demister to assist gas flow through the mixing chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.