Patent · US Active

Cleaning system for additive manufacturing

US12172379B2 · kind B2 · utility

0Cited by

212References

14Claims

0Family size

Assignees

General Electric Company · US
Unison Industries, LLC · US

Inventors

James Patrick Lewis · Dayton, US
Johnny Eric DeLeon, II · Arlington, US
Brian Paul Sechrist · Centerville, US
Mary Kathryn Thompson · Colfax, US
Christopher David Barnhill · Cincinnati, US
Meredith Elissa Dubelman · Kyles, US

Key dates

Filing date	Aug 9, 2022
Grant date	Dec 24, 2024
Priority date	—
Expiry date	Aug 9, 2042

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY02P10/25
WIPO fieldChemical engineering
WIPO sectorChemistry

Abstract

A cleaning system for an additively manufactured component includes a tank storing a cleaning fluid. A fluid circuit is operably coupled with the tank. A pump is coupled with the fluid circuit. A manifold is configured to receive fluid from the fluid circuit through the pump. At least one of a coupler defined by the manifold or a hose is coupled with the manifold. The at least one of the coupler defined by the manifold or the hose is further configured to couple with said additively manufactured component.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.