Anti-stiction enhancement of ruthenium contact

US12172888B2 · kind B2 · utility

Assignee

• Qorvo US, Inc. · US

Inventors

• James D. Huffman · Pittsford, US
• Mickael Renault · San Jose, US
• Shibajyoti Ghosh Dastider · Roseville, US
• Lance W. Barron · Plano, US
• Willibrordus G. M. Van Den Hoek · Eindhoven, NL

Key dates

• Filing date: Aug 6, 2020
• Grant date: Dec 24, 2024
• Expiry date: Jun 12, 2041

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01H59/0009
• WIPO field: Micro-structural and nano-technology
• WIPO sector: Chemistry

Abstract

A method of manufacturing a MEMS device. The MEMS device has a cavity in which a beam will move to change the capacitance of the device. After most of the device build-up has occurred, sacrificial material is removed to free the beam within the MEMS device cavity. Thereafter, exposed ruthenium contacts are exposed to fluorine to either: dope exposed ruthenium and reduce surface adhesive forces, form fluorinated Self-Assembled Monolayers on the exposed ruthenium surfaces, deposit a nanometer passivating film on exposed ruthenium, or alter surface roughness of the ruthenium. Due to the fluorine treatment, low resistance, durable contacts are present, and the contacts are less susceptible to stiction events.