Patent · US Active

Apparatus and method for exposure of relief precursors

US12174543B2 · kind B2 · utility

0Cited by

1References

26Claims

0Family size

Assignee

XSYS PREPRESS N.V. · BE

Inventors

Dirk Ludo Julien DE RAUW · Ninove, BE
Pieter Lenssens · Zottegem, BE
Frederik DEFOUR · Boezinge, BE

Key dates

Filing date	Jan 18, 2021
Grant date	Dec 24, 2024
Priority date	—
Expiry date	Aug 18, 2041

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/2014
WIPO fieldOptics
WIPO sectorInstruments

Abstract

Apparatus for exposure of a relief precursor includes a substrate layer and at least one photosensitive layer. The apparatus includes a first light source configured to illuminate a first side of the relief precursor, a movable second light source configured to illuminate a second side of the relief precursor opposite the first side, a movable shield located between the first light source and the second light source and configured to capture at least a portion of the light of the second light source transmitted through the relief precursor, and a moving means configured to move the movable shield simultaneously with the second light source.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.