System, method and device for temperature control
US12176226B2 · kind B2 · utility
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3References
13Claims
0Family size
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Key dates
| Filing date | Jan 12, 2022 |
| Grant date | Dec 24, 2024 |
| Priority date | — |
| Expiry date | Feb 4, 2043 |
Classification
- Technology area (CPC F)Mechanical Engineering; Lighting; Heating
- CPC primaryF27D2019/0031
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method for temperature control includes: acquiring the present temperature of a reaction window in a process chamber of a semiconductor machine; comparing the present temperature with the preset temperature to acquire a comparison result; and adjusting the exhaust amount of an exhaust passage of the process chamber based on the comparison result to control the temperature of the reaction window.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.