Patent · US Active

Method for producing an optoelectronic component, and optoelectronic component

US12176464B2 · kind B2 · utility

0Cited by
1References
13Claims
0Family size

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Key dates

Filing dateSep 26, 2018
Grant dateDec 24, 2024
Priority date
Expiry dateJan 7, 2039

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10H20/034

Abstract

A method for producing an optoelectronic component by providing a semiconductor layer sequence on a substrate where the semiconductor layer sequence is configured to emit radiation. The method may further include applying a contact layer to the semiconductor layer sequence where the contact layer has a layer thickness of at most 10 nm. The method may further include applying a reflective layer to the contact layer and applying a barrier layer directly to the reflective layer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.