Mask, method of manufacturing the same, and method of manufacturing display panel
US12178113B2 · kind B2 · utility
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16Claims
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Assignee
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Key dates
| Filing date | Aug 31, 2021 |
| Grant date | Dec 24, 2024 |
| Priority date | — |
| Expiry date | Dec 20, 2042 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10K59/12
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A manufacturing method of a mask includes forming a first mask layer, forming a second mask layer on the first mask layer, forming a photoresist pattern layer on the second mask layer, removing a first area of the second mask layer, which is exposed through the photoresist pattern layer, defining an opening through the first mask layer, removing a portion of the photoresist pattern layer to expose a portion of a second area of the second mask layer, and removing the portion of the second area of the second mask layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.