Atomic vapor cell, an integrated atomic/photonic device and apparatus comprising the atomic vapor cell, and a method for fabricating an atomic vapor cell
US12181541B2 · kind B2 · utility
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17Claims
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Key dates
| Filing date | Feb 16, 2023 |
| Grant date | Dec 31, 2024 |
| Priority date | — |
| Expiry date | Apr 6, 2043 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N24/006
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Provided is an atomic vapor cell, for atomic or molecular spectroscopy, optical pumping, and/or spin-based atomic sensing, that includes a host substrate and defined there within a buried or non-buried chamber laser written in the host substrate without the need of a mask or photoresist, with either planar or three-dimensional geometry, and intended to contain an atomic vapor.Also provided are an integrated atomic/photonic device and an apparatus, in both cases including the presently disclosed atomic vapor cell, and a method for fabricating the presently disclosed atomic vapor cell.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.