Resist composition and resist pattern forming method
US12181800B2 · kind B2 · utility
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Key dates
| Filing date | Aug 29, 2019 |
| Grant date | Dec 31, 2024 |
| Priority date | — |
| Expiry date | Sep 28, 2041 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/325
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A resist composition including a base material component (A), an acid generator component (B), and a mixed solvent (S) in which an organic solvent (S1) represented by Formula (s1) is mixed, in which the acid generator component (B) contains a compound (B1) represented by Formula (b1). In the formula, Rb1 represents an aryl group. Rb2 and Rb3 each independently represent an aliphatic hydrocarbon group. Lb1, Lb2, and Lb3 each independently represent a divalent linking group or a single bond. X− represents a counter anion. R1 and R2 each independently represent an alkyl group having 1 to 6 carbon atoms
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.