System and method for modeling damages caused by incident particles
US12182486B2 · kind B2 · utility
0Cited by
5References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 1, 2021 |
| Grant date | Dec 31, 2024 |
| Priority date | — |
| Expiry date | Oct 11, 2043 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06F30/25
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A method of modeling damages to a crystal caused by an incident particle includes obtaining particle information and crystal information; estimating energy loss of the incident particle based on the particle information and the crystal information; estimating a volume of a vacancy based on the energy loss; estimating a vacancy reaction based on the crystal information and the volume of the vacancy; and generating output data based on the vacancy reaction, the output data including quantification data of the damages.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.