Silicon-based self-assembling monolayer compositions and surface preparation using the same
US12187853B2 · kind B2 · utility
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26References
12Claims
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Key dates
| Filing date | Jun 18, 2021 |
| Grant date | Jan 7, 2025 |
| Priority date | — |
| Expiry date | Dec 31, 2041 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB05D2518/12
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Disclosed is a SAM forming composition comprising a SAM monomer or precursor having a backbone with a surface reactive group, wherein the backbone contains no Si—C bonds and is selected from the group consisting of a Si—C bond-free polysilane and a trisilylamine. The surface reactive groups are disclosed for the surface to be covered being a dielectric surface and a metal surface, respectively. A process of forming a SAM on a surface and a process of forming a film on the SAM are also disclosed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.