Patent · US Active

Magnet system and sputtering device

US12188119B2 · kind B2 · utility

0Cited by

1References

20Claims

0Family size

Assignee

VON ARDENNE Asset GmbH & Co KG · DE

Inventors

Klaus Schneider · Lappersdorf, DE
Goetz Grosser · Dresden, DE
Thorsten Sander · Dresden, DE
Ralf Hauswald · Bad Schandau, DE

Key dates

Filing date	Nov 11, 2022
Grant date	Jan 7, 2025
Priority date	—
Expiry date	Jan 3, 2043

Classification

Technology area (CPC H)Electricity
CPC primaryH01J37/345
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

Disclosed herein are systems, methods, and devices related to a magnet system for a sputtering device. The magnet system includes a bearing frame and a magnet holder having a first mounting area and a second mounting area. The magnet system has a first support device mounted to the magnet holder by the first mounting area and a second support device mounted to the magnet holder by the second mounting area. At least one of the first mounting area and the second mounting area are configured such that a position in which the first support device and the second support device are mounted to the magnet holder relative to each other may be adjusted. The first support device and the second support device are configured to engage with the bearing frame to form a bearing device for supporting the magnet holder.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.