X-ray reflectometry apparatus and method thereof for measuring three dimensional nanostructures on flat substrate
US12188883B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 28, 2022 |
| Grant date | Jan 7, 2025 |
| Priority date | — |
| Expiry date | Jul 12, 2043 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2223/3303
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
This disclosure relates to an X-ray reflectometry apparatus and a method for measuring a three-dimensional nanostructure on a flat substrate. The X-ray reflectometry apparatus comprises an X-ray source, an X-ray reflector, a 2-dimensional X-ray detector, and a two-axis moving device. The X-ray source is for emitting X-ray. The X-ray reflector is configured for reflecting the X-ray onto a sample surface. The 2-dimensional X-ray detector is configured to collect a reflecting X-ray signal from the sample surface. The two-axis moving device is configured to control two-axis directions of the 2-dimensional X-ray detector to move on at least one of x-axis and z-axis with a formula concerning an incident angle of the X-ray with respect to the sample surface for collecting the reflecting X-ray signal.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.