Vacuum system, low-pressure vacuum process device, and cutoff member
US12191167B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Jan 20, 2022 |
| Grant date | Jan 7, 2025 |
| Priority date | — |
| Expiry date | Feb 25, 2043 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T137/86083
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
The present disclosure relates to the technical field of semiconductors, and provides a vacuum system, a low-pressure vacuum process device, and a cutoff member. The vacuum system includes: a vacuum pump; an exhaust pipeline, wherein one end of the exhaust pipeline is used to communicate with a chamber to be evacuated, and the other end of the exhaust pipeline communicates with the vacuum pump; and a cutoff member, wherein the cutoff member is connected to the exhaust pipeline, the cutoff member includes a filter portion and a carrier portion, the filter portion includes a passage, the carrier portion includes an accommodation groove, and the passage communicates with the accommodation groove.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.